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MCS,PHD
Argosy University/ Phoniex University/
Nov-2005 - Oct-2011
Professor
Phoniex University
Oct-2001 - Nov-2016
Discuss whether the mask set in Problem 2.1 will realize the resistance exactly. What would be the effect of window design on the resistance? Discuss at least two other mechanisms in the processing that can make the processed resistance deviate from the target value even if the effect of the window is neglected.
Problem 2.1
Design three masks for diffusion, window, and metal layers to realize a 1-kΩ resistor with n-type diffusion with sheet resistance of 100 Ω per square and lead metal lines. The minimum feature size allowed is 1 µm for line width and window opening. Also, 0.5-µm extension of metal feature and diffusion feature over the window opening is required.
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