Maurice Tutor

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    Oct-2001 - Nov-2016

Category > Management Posted 21 Oct 2017 My Price 7.00

vacuum chamber,

15.13 A vacuum chamber, as used in sputtering electrically conducting thin films on microcircuits, is comprised of a baseplate

maintained by an electrical heater at Ts  = 300 K and a shroud within the enclosure maintained at 77 K by a liquid-nitrogen (LN2) coolant loop. LN2 enters as a saturated liquid, experiences evaporation, and exits the loop as saturated vapor. The baseplate, insulated on the lower side, is 0.3 m in diameter and has an emissivity of å = 0.25.

(a) How much electrical power Pe must be provided to the baseplate heater?

(b) At what rate must liquid nitrogen be supplied to the shroud if its heat of vaporization (hfg) is 125 kJ/kg?

(c) To reduce the liquid-nitrogen consumption, it is proposed to bond a thin sheet of aluminum foil (å  =0.09) to the baseplate. Will this have the desired effect?

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Maurice Tutor
(5)
Status NEW Posted 21 Oct 2017 08:10 PM My Price 7.00

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